A Brief Review of Atomic Layer Deposition From Fundamentals to Applications
The scientific and technological interest in atomic layer deposition (ALD) and atomic layer etching (ALE) has been surging in the last decade and the sheer volume of ALD and ALE papers can make it difficult to get a clear overview of what is going on. Luckily, the studies and trends are ofttimes summarized and compared in review papers. Our blogpost in 2019 almost our latest review on plasma ALD also included a comprehensive overview of ALD review papers. Even so at present we have taken it one step further: we have tabulated the ALD and ALE review papers to date in a ReviewBase that is accessible directly from our weblog. Just click the link in the header of this webpage. In this mail we highlight some trends and conclusions that tin be drawn from the ALD and ALE ReviewBase.
Since our blogpost in 2019, the number of ALD review papers has increased by 50%, which is quite astonishing and underlines the popularity of the method. Nonetheless in the recent years, ALE has been gaining traction too. In 2015 several ALE review papers appeared, most as function of a focus upshot in the ECS Journal of Solid State Science and Engineering on Atomic Layer Etching and Cleaning. Furthermore, in the same twelvemonth the seminal review "Overview of diminutive layer etching in the semiconductor manufacture" by Keren Kanarik appeared in the Journal of Vacuum Scientific discipline and Engineering science A.
The aforementioned ReviewBase can be used to scan all the review papers in the field of ALD and ALE. I can sort by author, year, journal and more than. The well-nigh popular review papers can be identified at a glance. Ane tin spot some interesting trends and fun facts from this ReviewBase: changes in popularity, the rate of growth in citations, emerging topics, and rising stars. Nosotros annotate on these below.
Earlier doing that, let's showtime briefly describe how nosotros put this ReviewBase together.
Input for ALD & ALE ReviewBase and how you can contribute
To generate the ReviewBase for ALD and ALE we used Web-of-Science. As search terms we but used "Atomic Layer Deposition" or "Atomic Layer Carving" and as "document blazon" we cull "review". We also added some publications manually. Hither two aspects are important to consider. Beginning of all, it is sometimes a greyness area what is exactly a review paper and what non. Note that non all reviews are listed every bit such in Web-of-Science. So here we used our ain judgement. Secondly, there are certainly some reviews missing in the list. This holds for case for older ones on ALD (recollect about papers when the method was still known equally "Atomic Layer Epitaxy", come across postal service about history of ALD). Nosotros plan to add these and other reviews manually over fourth dimension. Even so, very importantly, you can also notify us about missing review papers by leaving a comment or past sending united states of america a message. Nosotros are happy to add those after verifying the review nature of the publication.
Top six ALD review papers
The number of citations per yr of the top 6 virtually cited ALD review papers is shown in the effigy in a higher place. We picked the offset 6 because these cover general ALD, while more specific applications are covered past papers lower in the list. The graph is not cumulative, instead it shows the increment in citations per year. The elevation 6 does not appear to have shifted much since our final blogpost nigh the review papers. The George 2010 paper—"Atomic Layer Degradation: An Overview"—is conspicuously the most popular withal, and the growth of all of the papers except for the Johnson 2013 paper—"A brief review of diminutive layer deposition: from fundamentals to applications"—appears to be steady. The paper past Johnson et al. stands out: its citations per year count has increased dramatically, perchance it is related to its open up access nature. While growth may appear to accept levelled in recent years, the total amount of review papers and citations keeps increasing, leading to greater-than-linear growth for the collective review papers.
Top 5 ALE review papers
Coordinating to the graph of the ALD reviews, the most popular ALE review papers show steady growth too. We bear witness the first 5, which cover full general ALE. The main exception to steady growth is the George 2020 review newspaper—focusing on general ALE—which obviously has gained traction. Thermal ALE is a relatively new evolution, essentially catering to an entire new ALE subfield.
Emerging trends in ALD
The tiptop twenty ALD review papers are shown in the table at the stop of this blog post. From this table, we can identify a few trends. Because the diversity in ALE papers is not yet wide enough, this analysis is only performed on the ALD review papers.
The success of the superlative 6 has been explained already, but other trends tin can be subdivided amidst several topics. Important to annotation is that approximately half of all ALD reviews specifically focus on applications of ALD, where the paper of Knez 2007 is a highly-cited instance, covering the manufacture of nanostructures using ALD. Other applications of ALD are catalysis in the papers of O'Neil 2015 and Lu 2013, Li-ion batteries by Meng 2012, using ALD to coat porous materials by Detavernier 2011, and energy and environment by Marichy 2012. Approximately half of application-focused ALD reviews cover energy applications, including solar cells, batteries, (photograph-/electro-)catalysis, and fuel cells. 1 explanation for the surge in free energy applications may exist the push for energy-efficient devices.
A 2d category for ALD review papers is ALD techniques. Three papers stand out, namely a paper on plasma-enhanced ALD (PEALD) by Profijt 2011, a spatial ALD review newspaper past Poodt 2012, and surface area-selective ALD by Mackus 2014. The field of ALD is mature enough to spawn subfields detailing new applications. The iii ALD variants evidence that ALD comes in more than and more 'flavors'.
Materials that have shown upward in the review papers are metals and nitrides in the paper of Kim 2003, ZnO in the paper of Tynell 2014, and noble metals in the paper of Hämäläinen 2014. Well-nigh 1 in 4 of all ALD reviews covers specific materials, such as TiO2, ZnO, and the budding field of 2D materials.
Lastly, Langereis 2011 detailed the employ of in-situ ellipsometry to characterize ALD, which is a relatively mutual method to track the growth per cycle present.
ALD and ALE are both rapidly growing fields. The foundation (of the near popular review papers) is steady, indicating that the insights or explanations therein may still exist relevant to new papers. Review papers about more specific applications evidence that the ALD field is large plenty to show diverging applications, ranging from specific materials to the awarding methods themselves (see also our weblog post nearly applications of ALD). The steady increase in citations indicates that the fields are not slowing down. As more niche applications for ALD and ALE are plant, broader adoption is to be expected. New applications are yet being plant: ALD has been used in food packaging and medicine as well, and if the claim are clear, it volition merely be a affair of time before a review paper can be read well-nigh this.
The steady growth of the fields shows that every bit the smallest-scale manufacturing processes shrink more and more, the impact of ALD and ALE grows.
| Authors | Title | Citations | Journal | Twelvemonth published | |
|---|---|---|---|---|---|
| George | Atomic Layer Deposition: An Overview | 3717 | Chem. Rev. | 2010 | ● |
| Puurunen | Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process | 1830 | J. Appl. Phys. | 2005 | ● |
| Miikkulainen et al. | Crystallinity of inorganic films grown by atomic layer degradation: Overview and full general trends | 956 | J. Appl. Phys. | 2013 | ▲ |
| Leskelä et al. | Diminutive Layer Deposition (ALD): from precursors to thin movie structures | 893 | Thin Solid FIlms | 2002 | ★ |
| Johnson et al. | A brief review of atomic layer deposition: from fundamentals to applications | 849 | Mater. Today | 2014 | ▲ |
| Leskelä et al. | Atomic layer deposition chemistry: Recent developments and future challenges | 814 | Angew. Chem.-Int. Edit. | 2003 | ▼ |
| Knez et al. | Synthesis and surface engineering of complex nanostructures by atomic layer deposition | 563 | Adv. Mater. | 2007 | ▼ |
| Profijt et al. | Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges | 551 | J. Vac. Sci. Technol. A | 2011 | ● |
| Kim | Diminutive layer deposition of metal and nitride sparse films: Electric current research efforts and applications for semiconductor device processing | 480 | J. Vac. Sci. Technol. B | 2003 | ▼ |
| Kim et al. | Applications of diminutive layer deposition to nanofabrication and emerging nanodevices | 447 | Sparse Solid Films | 2009 | ▼ |
| O'Neill et al. | Catalyst Design with Atomic Layer Deposition | 422 | ACS Catal. | 2015 | ● |
| Meng et al. | Emerging Applications of Diminutive Layer Deposition for Lithium-Ion Battery Studies | 410 | Adv. Mater. | 2012 | ▼ |
| Marichy et al | Atomic layer degradation of nanostructured materials for energy and environmental applications | 409 | Adv. Mater. | 2012 | ★ |
| Detavernier et al. | Tailoring nanoporous materials by atomic layer degradation | 275 | Chem. Soc. Rev. | 2011 | ▼ |
| Tynell et al. | Diminutive layer deposition of ZnO: a review | 256 | Semicond. Sci. Technol. | 2014 | ▼ |
| Langereis et al. | In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition | 227 | J. Phys. D-Appl. Phys. | 2009 | ▼ |
| Hamalainen et al. | Atomic Layer Degradation of Noble Metals and Their Oxides | 221 | Chem. Mat. | 2014 | ● |
| Mackus et al. | The employ of diminutive layer deposition in advanced nanopatterning | 221 | Nanoscale | 2014 | ▲ |
| Luet al. | Synthesis and Stabilization of Supported Metallic Catalysts by Atomic Layer Deposition | 204 | Accounts Chem. Res. | 2013 | ▼ |
| Poodtet al. | Spatial atomic layer deposition: A route towards farther industrialization of atomic layer deposition | 194 | J. Vac. Sci. Technol. A | 2012 | ▼ |
The full ALD and ALE reviews tables can be found here in excel and PDF class.
The ReviewBase has been put together by Joost Maas, Miika Mattinen, Damage Knoops, Bart Macco and Erwin Kessels. They will also accept intendance of the content management and they all contributed to this web log postal service. The title effigy was created with www.wordclouds.com using all the review titles from the ALD ReviewBase.
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Source: https://www.atomiclimits.com/2022/03/26/launch-the-ald-ale-reviewbase-an-easy-to-access-overview-of-all-ald-and-ale-review-papers/
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